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⌄ Resolution Enhancement Techniques in Optical Lithography (SPIE Tutorial Texts in Optical Engineering Vol. TT47) hare Һ Kindle Ebook Author Alfred Kwok Kit Wong ᠂

⌄ Resolution Enhancement Techniques in Optical Lithography (SPIE Tutorial Texts in Optical Engineering Vol. TT47) hare Һ Kindle Ebook Author Alfred Kwok Kit Wong ᠂ ⌄ Resolution Enhancement Techniques in Optical Lithography (SPIE Tutorial Texts in Optical Engineering Vol. TT47) hare Һ Kindle Ebook Author Alfred Kwok Kit Wong ᠂ This tutorial summarizes optical lithography enhancement research and development over the past 20 years Discusses theoretical and practical aspects of commonly used techniques, including optical imaging and resolution, modified illumination, optical proximity correction, alternating and attenuating phase shifting masks, selecting RETs, and second generation RETs Useful for students and practicing lithographers.Contents Foreword Preface List of symbols Introduction Optical imaging and resolution Modified illumination Optical proximity correction Alternating phase shifting mask Attenuated phase shift mask Selecting appropriate RETs Second generation RETs Concluding 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    • Resolution Enhancement Techniques in Optical Lithography (SPIE Tutorial Texts in Optical Engineering Vol. TT47)
    • 1.3
    • 47
    • 234 pages
    • 0819439959
    • Alfred Kwok Kit Wong
    • English
    • 09 October 2016

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